1 中国科学院光电技术研究所, 成都 610209
2 中国科学院大学 光电工程学院, 北京 100049
设计了193nm窄角度和宽角度入射增透膜以及正入射高反膜, 其中增透膜s和p偏振光透射率的最大偏差分别为0.17%和0.44%。结合标量散射理论和等效吸收层近似理论, 多层膜间的粗糙界面等效为薄的吸收层, 基于薄膜本征传输矩阵计算分析了不同界面粗糙度下的光谱性能。研究发现, 薄膜光谱性能随着界面均方根粗糙度的增加而急剧退化, 高反膜反射带宽也随之降低, 达到4nm时, 宽角度入射增透膜和高反膜光谱性能在193nm处分别退化2.04%和2.09%。界面粗糙度是影响高光谱性能真空紫外光学薄膜制备的重要因素。
真空紫外光学薄膜 界面粗糙度 等效吸收层 增透膜 高反膜 vacuum ultraviolet optical thin film interface roughness effective absorption layer antireflection coatings high reflection coatings
1 中国科学院大学光电学院，北京 100049
2 中国科学院光电技术研究所薄膜光学技术研究室，四川 成都 610209
光学薄膜在制备和使用过程中会因缺陷和污染等产生吸收中心，当薄膜受激光辐照后，吸收中心吸收光能会产生热信号，根据热信号可以测量光学薄膜的光学吸收损耗。本文提出基于红外热像仪测量薄膜光学吸收损耗的方法，在测试中加入参考样品可以减少环境温度变化和热像仪噪声对于温度测试结果的影响，对测量过程温度场取一定面积进行平均减少了激光指向波动和光斑分布不理想导致的有限元仿真计算误差。使用本方法测试了小尺寸45°的高反膜吸收损耗，测试得到吸收损耗为7.60 ppm，且测试了同批次大尺寸光学薄膜样品吸收损耗的空间分布情况。使用本方法测量的光学薄膜吸收率和激光量热测试结果一致，不需要长时间的恒温和严格环境温度控制，且测试样品尺寸不受限制。
薄膜光学 吸收损耗 红外热像仪 有限元 吸收测量 optical thin film absorption loss infrared thermography finite element absorption measurement
1 中国科学院光电技术研究所, 四川成都 610209
2 中国科学院大学, 北京 100049
3 电子科技大学光电科学与工程学院, 四川成都 610054
二氧化硅(SiO2)是光学系统中最常用光学薄膜材料之一, 其微观结构、缺陷等信息对于研究和提高薄膜的性能具有重要作用。本文通过电子束蒸发、离子辅助、磁控溅射方法制备 SiO2薄膜并进行测试, 计算出其吸收边光谱, 对吸收边光谱的强吸收区、e指数区、弱吸收区进行分段分析得到 SiO2薄膜的带隙宽度、带尾能量和氧空位缺陷含量数据。进一步分析三种薄膜和其在常规退火温度下的带隙宽度、带尾能量和氧空位缺陷含量的数据, 获得 SiO2薄膜的微观原子排列结构、微观缺陷信息, 并对不同镀膜技术和不同退火温度下 SiO2薄膜的原子排列结构、微观缺陷的差异和变化进行了分析和讨论。
SiO2薄膜 带隙宽度 带尾能量 氧空位缺陷 SiO2 film bandgap Urbach tail energy oxygen deficiency centers 光电工程
2019, 46(4): 18022010
Author Affiliations
Abstract
1 Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2 University of Chinese Academy of Sciences, Beijing 100039, China
3 School of Optoelectronic Information, University of Electronic Science and Technology of China, Chengdu 610054, China
To simultaneously obtain high-resolution multi-wavelength (from visible to near infrared) tomographic images of the solar atmosphere, a high-performance multi-wavelength optical filter has to be used in solar imaging telescopes. In this Letter, the fabrication of the multi-wavelength filter for solar tomographic imaging is described in detail. For this filter, Ta2O5 and SiO2 are used as high- and low-index materials, respectively, and the multilayer structure is optimized by commercial Optilayer software at a 7.5° angle of incidence. Experimentally, this multi-wavelength optical filter is prepared by a plasma ion-assisted deposition technique with optimized deposition parameters. High transmittance at 393.3, 396.8, 430.5, 525, 532.4, 656.8, 705.8, 854.2, 1083, and 1565.3 nm, as well as high reflectance at 500 and 589 nm are achieved. Excellent environmental durability, demonstrated via temperature and humidity tests, is also established.
310.0310 Thin films 310.1860 Deposition and fabrication Chinese Optics Letters
2017, 15(12): 123101
Author Affiliations
Abstract
1 Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2 University of Chinese Academy of Sciences, Beijing 100039, China
To improve the optical performance of an antireflection (AR) coating on a micro-spherical substrate, the ray angle of the incidence distribution and the thickness profile are taken into consideration during the optical coating design. For a convex spherical substrate with a radius of curvature of 10 mm and a clear aperture of 10 mm, three strategies are used for the optimization of the spectral performance of a broadband AR coating in the spectral region from 480 to 720 nm. By comparing the calculated residual reflectance and spectral uniformity, the developed method demonstrates its superiority in spectral performance optimization of an AR coating on a micro-spherical substrate.
310.0310 Thin films 310.1860 Deposition and fabrication 310.6805 Theory and design Chinese Optics Letters
2016, 14(9): 093101
针对飞机过度滞后会导致飞行员诱发振荡的问题, 提出综合运用频域法和时域法对过度滞后与飞行员诱发振荡间的关系进行定量研究。建立了简化的人机闭环系统模型, 分析了人机闭环系统不稳定的充要条件。频域内应用伯德图和尼柯尔斯图对有效飞机频域特性进行了分析, 通过带宽准则和平均相位速率准则对有效时延与飞行员诱发振荡间的关系进行定量评估。时域内运用飞机的飞行员诱发振荡时间历程曲线及延迟时间与飞行品质评分间关系曲线, 对过度滞后的影响进行了定量研究。研究结果可为控制飞机的过度滞后提供定量依据。
飞行控制系统 飞行员诱发振荡 带宽准则 平均相位速率准则 过渡滞后 flight control systems pilot induced oscillation bandwidth criterion phase rate criterion excessive lag
Author Affiliations
Abstract
An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on the reflectance spectra measured at different angles of incidence, is also presented. The optical constants are determined by fitting the measured spectra to the theoretical models. The proposed method is applied to determine the refractive index and extinction coefficient (n, k) of MgF2 film deposited on silicon substrate by electron beam evaporation with substrate temperature 300 oC and deposition rate 0.2 nm/s. The determined n, k values at 193 nm are 1.433 and 9.1 \times 10-4, respectively.
310.0310 Thin films 310.1860 Deposition and fabrication Chinese Optics Letters
2013, 11(s1): S10607
Author Affiliations
Abstract
It is well known that the optical property of an optical thin film can be influenced by even small inhomogeneity of refractive index (RI). In order to investigate the RI inhomogeneity of LaF3 single layer in deep ultraviolet (DUV) range, single-layer LaF3 samples deposited on fused silica and CaF2 substrates are prepared by resistive heating evaporation at different deposition temperatures. The reflectance and transmittance spectra of LaF3 film samples are measured with a spectrophotometer, and used to calculate the RI inhomogeneity. The experimental results show that no RI inhomogeneity of LaF3 film is observed when deposited on CaF2 substrate, while negative RI inhomogeneity is presented when deposited on fused silica substrate. The level of inhomogeneity is affected by the substrate temperature, which decreases with the increasing substrate temperature from 250 to 400 oC.
310.6188 Spectral properties 310.6860 Thin films, optical properties Chinese Optics Letters
2013, 11(s1): S10602
Author Affiliations
Abstract
We report the simulation results on the thickness uniformity of optical coatings deposited on spherical substrates by optimizing the geometric configuration parameters, such as tilting angle of the substrate holder and position of the evaporation source in a 1 000-mm-diameter planetary rotation stage (PRS). We reveal that good film uniformity on convex spherical surfaces or flat substrates, as well as concave surfaces with weak to moderate curvatures can be obtained through appropriate tilting of the substrate holder. For 300-mm-diameter substrates with clear aperture to radius of curvature (CA/RoC) between -0.3 and 0.7, the achievable film uniformity is above 99%. The source position is optimized to achieve good film uniformity.
310.0310 Thin films 310.1860 Deposition and fabrication Chinese Optics Letters
2013, 11(s1): S10213
1 中国科学院 光电技术研究所, 四川 成都 610209
2 中国科学院大学, 北京 100049
研究了确定单层MgF2薄膜的物理厚度及其在深紫外/真空紫外波段折射率的方法。首先, 利用钼舟热蒸发工艺在B270基底上制备了单层MgF2薄膜。然后, 依据MgF2单层膜在不同入射角下的反射光谱, 采用模拟退火方法确定了MgF2薄膜在170~260 nm波段的折射率和物理厚度, 并与由椭圆偏振法确定的薄膜参数进行了比较。实验显示, 采用模拟退火和椭圆偏振两种方法确定的MgF2薄膜厚度分别为248.5 nm和249.5 nm, 偏差为0.4%; 而用上述两种方法在240~260 nm波段确定的单层MgF2薄膜的折射率偏差均小于0.003。得到的结果证实了依据不同入射角下的反射光谱, 用模拟退火方法确定MgF2薄膜厚度和折射率的可靠性。
薄膜参数测量 折射率测量 膜厚测量 模拟退火算法 thin film parameter measurement refractive index measurement thin film thickness measurement simulated annealing algorithm MgF2 MgF2
